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ROUND LAB Pine Calming Cica Mask 1ea

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ROUND LAB Pine Calming Cica Mask 1ea

ROUND LAB Pine Calming Cica Mask 1ea

ROUND LAB Pine Calming Cica Mask 1ea

Restore calm in troubled skin with this sheet mask containing pine tree extract and five types of cica-based ingredients to instantly cool and soothe irritated skin. The mask is boosted with hyaluronic acids in different molecular sizes to up skinā€™s moisture levels. The double wave mask sheet is designed with air holes to allow swift absorption of active ingredients.
How to Use:
  1. Apply on clean skin and leave on for 10-20 minutes.
  2. Take off and gently pat to promote absorption.

Major Ingredients:

Water, Pinus Densiflora Leaf Extract, Glycerin, Dipropylene Glycol, Glycereth-26, Centella Asiatica Extract, Hyaluronic Acid, Hydrolyzed Hyaluronic Acid, Sodium Hyaluronate, Butylene Glycol, Portulaca Oleracea Extract, Propanediol, Chondrus Crispus, Ethylhexylglycerin, Biosaccharide Gum- 1. Glycoproteins, Ammonium Polyacryloyldimethyl Taurate, Tromethamine, Polyglyceryl-4 Caprate, Asiaticoside, Asiatic Acid, Madecassoside, Madecassic Acid, Polyglyceryl-6 Caprylate, Capryloyl Salicylic Acid, Hydroxyethylcellulose, 1,2-Hexanediol, Hydroxyacetophenone, Disodium EDTA, Xanthan Gum, Carbomer

$0.76

Original: $2.17

-65%
ROUND LAB Pine Calming Cica Mask 1eaā€”

$2.17

$0.76

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Description

ROUND LAB Pine Calming Cica Mask 1ea

Restore calm in troubled skin with this sheet mask containing pine tree extract and five types of cica-based ingredients to instantly cool and soothe irritated skin. The mask is boosted with hyaluronic acids in different molecular sizes to up skinā€™s moisture levels. The double wave mask sheet is designed with air holes to allow swift absorption of active ingredients.
How to Use:
  1. Apply on clean skin and leave on for 10-20 minutes.
  2. Take off and gently pat to promote absorption.

Major Ingredients:

Water, Pinus Densiflora Leaf Extract, Glycerin, Dipropylene Glycol, Glycereth-26, Centella Asiatica Extract, Hyaluronic Acid, Hydrolyzed Hyaluronic Acid, Sodium Hyaluronate, Butylene Glycol, Portulaca Oleracea Extract, Propanediol, Chondrus Crispus, Ethylhexylglycerin, Biosaccharide Gum- 1. Glycoproteins, Ammonium Polyacryloyldimethyl Taurate, Tromethamine, Polyglyceryl-4 Caprate, Asiaticoside, Asiatic Acid, Madecassoside, Madecassic Acid, Polyglyceryl-6 Caprylate, Capryloyl Salicylic Acid, Hydroxyethylcellulose, 1,2-Hexanediol, Hydroxyacetophenone, Disodium EDTA, Xanthan Gum, Carbomer

ROUND LAB Pine Calming Cica Mask 1ea | Amuse Ground